Semitherm VTP Diffusion Systems

The Semitherm VTP 1500X is an outstanding vertical diffusion system for the processing of wafers up to 200mm:

• Process parameters are controlled by a new system developed from the industry leading TMX controller, the de facto standard for horizontal furnace systems
• Efficient and robust automation utilising industry standard robotics and a pneumatically operated jar/element lift mechanism
• A process tube replacement time of < 15 minutes means the element can remain hot and removes the need for reprofiling
• High throughput using three tower load/unload system
• Space efficient with a footprint of < 2 square metres, and < 2.8 metres tall
• Configurations available for most applications including wet & dry oxidation, anneal, LPCVD, ultra thin gate dialectric, ultra low temp anneal for BEOL, and ultra low temp LCVD